SPS discharge plasma in sintering furnace

Domestic SPS discharge plasma hot pressing sintering furnace

General description:

1) In recent years, a new sintering technology named SPS (spark plasma sintering) has become more and more popular;

2) Based on years of industrial manufacturing experience and the vacuum hot pressing furnace technology, we have developed SPS type high temperature hot pressing sintering furnace by adopting new technology;

3) In SPS technology, we use direct DC pulse heating to make it possible to achieve cycle in a few minutes.

Direct current can increase the sintering activity of many samples, such as a lot of powder particles (Joule heating, discharge, electromigration, etc.), so it can be used with lower temperature and lower mold pressure than the traditional hot pressing technology; SPS can be used to research and produce materials with special properties, such as:

1) Nano materials can be sintered without complete particle growth process;

2) Functional materials (FGM) can be produced;

3) Synthetic materials;

4) New cemented carbide can be developed;

5) It can develop research on aluminum or copper alloys and intermetallic compounds;

6) Structural or functional ceramics can be developed;

The hardware and software features of the instrument are as follows

1) The instrument has a complete set of digital hydraulic system and precise speed / pressure control through an optical positioning sensor;

2) The equipment consists of furnace body, pressure system, vacuum system, control system and DC pulse power supply. It can be used for hot pressing sintering in vacuum and protective atmosphere;

3) The highest sintering temperature is 2400 ℃, which is measured by thermocouple and infrared instrument;

4) All sintering process parameters can be programmed, so any sintering process can be operated automatically. The microcomputer controller can operate various sintering schemes flexibly and record various operation parameters for future analysis. The function of the software is very complex and powerful, so there will be no limitation in use, which means that every sample or scheme can be realized;